Transient Properties of HiPIMS Discharges.

      Аннотация: HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions.

Ключевые слова: Mass spectrometry, High Power Impulse Magnetron Sputtering, HiPIMS, Pulsed Magnetron Discharge, Time-Resolved Diagnostics, Time Resolved Plasma Potential, deposition rate, Heat flux, Thermal Flux, Time-Resolved Ion Energy Distributions, LANGMUIR PROBE