Growth of Functional Thin Films. By HiPIMS Fundamentals, Challenges, and Applications

      Аннотация: Thin film materials technology is the fundament of all current modern technologies such as electronics, computers, data storages, displays, mobile devices and Internet network communications. Numerous techniques are available to grow high-quality thin films, such as chemical vapor deposition, thermal evaporation, atomic layer deposition, and sputtering. Magnetron sputtering is the most versatile technique for deposition of thin films. It can be sub-categorized to various methods such as dc magnetron sputtering (dcMS), rf magnetron sputtering (rfMS) and high power impulse magnetron sputtering (HiPIMS).

Ключевые слова: surface diffusion, Ehrlich barrier, Thin Film Nucleation, deposition, thermodynamics, wetting, Film growth modes, Plasma for Materials Science, Reactive sputtering, plasma